May 22, 2014. KLA-Tencor has announced the Teron SL650, a new reticle quality-control solution for IC fabs that supports 20-nm design nodes and beyond. With 193-nm illumination and multiple STARlight ...

The semiconductor industry, constrained by the protracted delay in the introduction of next-generation lithography, has had to extend optical lithography below the 100-nanometer node by adopting ...

SAN JOSE – KLA-Tencor Inc. has introduced a new product that identifies reticle design errors by inspecting the wafer in the IC production process. The product enbles chip makers to qualify the ...

Benchmark is the world's leading independent supplier of test reticles for lithography systems. For 3 decades, our products have been used by wafer fabs and fab equipment and materials suppliers to ...