Fig. 1 The lithography process. The projection lithography system. The advancement of semiconductor manufacturing is a key driver of electronic device innovations. As Moore’s Law progresses, ...
Researchers review AI-powered inverse lithography, showing how deep learning boosts chip patterning precision and efficiency while facing scaling challenges. Computational lithography optimizes the ...
TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP) (TOKYO: 7912) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography ...
Imagine a machine so advanced it operates with light invisible to the human eye, etching circuits onto silicon wafers at scales smaller than a virus. This is the world of EUV lithography, a ...
Extreme Ultraviolet (EUV) lithography represents a transformative advancement in semiconductor fabrication, utilising 13.5‐nm wavelength light to achieve remarkably fine feature sizes far below the 10 ...
Canon has developed a new approach to lithography that reduces costs and energy consumption compared to ASML's EUV systems. Canon's new nanoimprint lithography machine imprints circuit patterns "like ...
Scanning probe lithography (SPL) represents a rapidly evolving class of nanofabrication techniques that utilise the precision of scanning probe microscopy to directly manipulate material surfaces at ...
SANTA CLARA, Calif., Feb. 28, 2023 (GLOBE NEWSWIRE) -- Applied Materials, Inc. today introduced a new eBeam metrology system specifically designed to precisely measure the critical dimensions of ...
TOKYO, Oct. 1, 2025 /PRNewswire/ -- Nikon Corporation is reaffirming the availability of its Digital Lithography System, DSP-100, with orders having commenced in July 2025. This system is specifically ...
New Ultra Track Leverages ACM’s Extensive Coater and Developer Expertise; ArF Model Expected to Ship in the Fourth Quarter of 2022 FREMONT, Calif., Nov. 17, 2022 (GLOBE NEWSWIRE) -- ACM Research, Inc.
Nanoimprint lithography (NIL) is an advanced nanofabrication technique capable of creating patterns and structures smaller than 10 nm with low cost, high throughput ...