Computational lithography and mask optimization techniques are at the forefront of enabling the semiconductor industry's continued miniaturisation of integrated circuits. This field encompasses ...

A new technical paper titled “Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types” was published by Hanyang University and Paul Scherrer ...

Figure 1. Comparison between conventional imaging using an imaging system (left) and “diffractive imaging” (right). In both cases, the sample needs to be illuminated by EUV light. However, the ...

Concept of mask/wafer co-optimization by moving the shot with mask and wafer double simulation to minimize wafer error. VSB shot configurations and its corresponding ...

Computer chips are undoubtedly one the great wonders of the modern world, incredible feats of engineering. And just when you thought they couldn't get any more complex and intriguing, here comes ...

The European Mask and Lithography Conference (EMLC) 2024 recently was held in Grenoble, France, and had about 190 participants from a wide range of companies and institutions. Being relatively new to ...

Colloidal lithography is a nanofabrication technique that utilizes colloidal particles as masks for creating ordered nanostructures on substrates. This cost-effective and scalable method has gained ...

Multiphoton lithography (often called multiphoton 3D lithography) is an additive manufacturing approach for fabricating intricate micro- and nanostructures. It relies on nonlinear optical absorption, ...

Invented 20 years ago, nanoimprint lithography offers a powerful manufacturing alternative for the semiconductor and other nanotechnology sectors, says Helmut Schift Pressing matter A technician from ...